Laser Source for Advanced Nonlinear Microscopy CRONUS-3P

  • High pulse energy for deep imaging
  • 1250 – 1800 nm tuning range for 3P imaging
  • Down to 50 fs pulse duration for high peak power
  • Automated wavelength and GDD control for optimal signal
  • Market-leading pulse-to-pulse energy stability

Features

  • High pulse energy for deep imaging
  • 1250 – 1800 nm tuning range for 3P imaging
  • Down to 50 fs pulse duration for high peak power
  • Automated wavelength and GDD control for optimal signal
  • Market-leading pulse-to-pulse energy stability

CRONUS-3P is a laser source developed for advanced nonlinear microscopy. It provides µJ-level pulses down to 50 fs at repetition rates of up to 2 MHz and tunable in the short-wavelength infrared (SWIR) range from 1250 to 1800 nm, thus covering the biological transparency windows at 1300 and 1700 nm for three-photon (3P) microscopy. In addition, CRONUS-3P offers integrated GDD control and beam steering, as well as simultaneous 1030 nm output.

Typically, multiphoton imaging in the SWIR range requires a complex multi-device laser system, a large optical table, and skilled staff. This reality encumbers neuroscience and other biomedical applications. The CRONUS-3P system is a next-generation, industrial-grade, single-supplier solution that is more compact, more reliable, and more versatile. It achieves tunable femtosecond excitation with integrated group delay dispersion (GDD) control, ensuring optimal pulse duration at the sample, while industrial-grade design guarantees high pulse-to-pulse energy and long-term power stability.

Model CRONUS-3P CRONUS-3P with power control
Tuning range 1) 1250 – 1800 nm
Repetition rate 2) Single-shot to 1 MHz / 2 MHz
  1300 nm 1700 nm 1300 nm 1700 nm
Pulse duration < 50 fs < 65 fs < 50 fs < 65 fs
Output power > 1100 mW @ 1 MHz
> 800 mW @ 2 MHz
> 800 mW @ 1 MHz
> 500 mW @ 2 MHz
> 1000 mW @ 1 MHz
> 700 mW @ 2 MHz
> 700 mW @ 1 MHz
> 400 mW @ 2 MHz
GDD control range 3) −4000 to +9000 fs2 −12000 to +3500 fs2 −4000 to +9000 fs2 −12000 to +3500 fs2
Beam diameter 4) 2 – 4 mm
Beam quality (M2) < 1.2
Beam ellipticity > 0.8
Beam divergence < 1 mrad
Long-term power stability, 24 h 5) < 1%
Pulse-to-pulse energy stability, 1 min 5) < 1%
  1. Alternative 2P+3P configuration with extended tuning range to 650 – 920 nm is available, contact sales@lightcon.com.
  2. Lower repetition rate with higher pulse energy option available.
  3. Continuous dispersion control; −3000 fs2 compensates a microscope with +3000 fs2.
  4. 1/e2, measured at compressor output.
  5. Expressed as NRMSD (normalized root mean squared deviation).
Model CRONUS-3P CRONUS-3P with power control
  1300 nm 1700 nm 1300 nm 1700 nm
Output power 1) > 1500 mW @ 1 MHz
> 1000 mW @ 2 MHz
> 1050 mW @ 1 MHz
> 700 mW @ 2 MHz
n/a
  1. Available only for v1. Contact sales@lightcon.com for more details.
Model CRONUS-3P CRONUS-3P with power control
Center wavelength 1030 ± 10 nm
Maximum output power 1) 40 W 
Maximum repetition rate  2 MHz
Pulse duration < 250 fs
  1. Simultaneous, at the expense of main output; contact sales@lightcon.com for details.
Model CRONUS-3P CRONUS-3P with power control
Center wavelength 1030 ± 10 nm
Maximum output power 1) 500 mW
Maximum repetition rate  ≈ 65 MHz
Pulse duration < 120 fs
  1. Simultaneous; contact sales@lightcon.com for details.
Model CRONUS-3P CRONUS-3P with power control
Operating temperature 1) 19 – 25 ºC (air conditioning recommended)
Relative humidity 1) 20 – 70% (non-condensing)
Electrical requirements Laser 100 V AC, 7 A – 240 V AC, 3A
Chiller 100 – 230 V AC; 50 – 60 Hz
Rated power Laser 600 W
Chiller 1400 W
Power consumption Laser 500 W
Chiller 1000 W
  1. Specifications are guaranteed for a maximum temperature variation of ± 1 oC and humidity variation of ± 10%.
Model CRONUS-3P CRONUS-3P with power control
Footprint without compressor
(L × W) 1)
855 × 391 mm (v2)
785 × 350 mm (v1)
n/a
Footprint with compressor
(L × W) 1)
855 × 391 mm (v2)
838 × 585 mm (v1)
855 × 391 mm (v2)
  1. See drawings for details.

3D nanopolymerization and damage threshold dependence on laser wavelength and pulse duration

D. Samsonas, E. Skliutas, A. Čiburys, L. Kontenis, D. Gailevičius, J. Berzinš, D. Narbutis, V. Jukna, M. Vengris, S. Juodkazis et al., Nanophotonics 0 (0) (2023).

We need to talk about laser pulse energy stability

L. Kontenis, M. Urbšas, J. Berzinš, and K. Neimontas, in Multiphoton Microscopy in the Biomedical Sciences XXIII, A. Periasamy, P. T. So et al., eds. (SPIE, 2023).

X-photon laser direct write 3D nanolithography

E. Skliutas, D. Samsonas, A. Čiburys, L. Kontenis, D. Gailevičius, J. Berzinš, D. Narbutis, V. Jukna, M. Vengris, S. Juodkazis et al., Virtual and Physical Prototyping 1 (18) (2023).

CRONUS-3P Laser Source for Advanced Nonlinear Microscopy

Product datasheet.

Rev. 21/08/2023. Size 325.4 KB.

Examples of Microscopy Applications

Application examples.

Rev. 21/08/2023. Size 3.7 MB.

CARBIDE Unibody-Design Femtosecond Lasers for Industry and Science

Product datasheet.

Rev. 04/09/2023. Size 0.6 MB.

I-OPA Industrial-Grade Optical Parametric Amplifier

Product datasheet.

Rev. 21/08/2023. Size 0.5 MB.

Laser Sources for Nonlinear Microscopy

Product catalog.

Rev. 04/09/2023. Size 5.3 MB.

Femtosecond Laser Systems for Science

Product catalog.

Rev. 04/09/2023. Size 16.6 MB.

飞秒激光器飞秒科研系统

Product catalog in Chinese.

Rev. 22/07/2023. Size 16.6 MB.

Processing Error

An error occured while processing request. Please reload window and try again. On repeated errors please contact sales@lightcon.com

Error code: